Sven Achenbach B.Sc., M.Sc., Ph.D.
Professor of Electrical and Computer Engineering
Canada Research Chair in Micro and Nano Device Fabrication
- Room 3B01 Engineering Building
- (306) 966-5307, (306) 668-9344
Sven Achenbach studied Mechanical Engineering at the University of Karlsruhe, Germany. Since 1996, he has worked at the national laboratory LURE in Paris and the German national laboratory Forschungszentrum Karlsruhe (FZK), optimizing microfabrication process technologies. He received his Ph.D. on ultra deep X-ray lithography in 2000.
His research focuses on various aspects of X-ray lithography process technology and on selected applications areas (including RF MEMS and micro/nano fluidics). The research is carried out at various electron storage rings worldwide, in cooperation with several laboratories, universities and companies in Europe, America and Asia.
In 2005, Sven Achenbach assumed the Canada Research Chair in Micro and Nano Device Fabrication at the University of Saskatchewan, Saskatoon, Canada. He is a Professor of Electrical Engineering, Principal Investigator and Beam Team Leader at SyLMAND, Canada's first X-ray lithography laboratory, and an Adjunct Scientist of Telecommunication Research Labs of Canada (TRLabs) at Innovation Place, Saskatoon.
The main focus of current activities is finishing capital construction and scientific commissioning of SyLMAND, the Synchrotron Laboratory for Micro and Nano Devices, at the Canadian Light Source (CLS). SyLMAND is a unique, multi million $ facility in Canada, comprising a dedicated synchrotron beamline and several wet chemical, metrology and preparation labs in a clean room environment.
Recent applications of research projects include high performance active and passive RF MEMS devices, biomedical detectors and microdfluidic test patterns as well as optical components such as IR bandpass filters
Selected Journal Papers
|||S. Achenbach, M. Hashemi, B. Moazed, D. Klymyshyn: "Fabrication and el. Characterisation of an all-PMMA and PMMA/lipid bi-layer single-submicron-Pore electrophoretic Flow Detector for biomedical Applications". Microelectronic Engineering, Vol 98 (2012) pp. 630-633|
|||S. Achenbach, M. Hashemi, B. Moazed, D. Klymyshyn: PMMA Polymer Membrane–based Single Cylindrical Submicron Pores: "Electrical Characterisation and Investigation of their Applicability in Resistive-Pulse Biomolecule Detection". American Journal of Analytical Chemistry, Vol. 3 (2012) pp. 534-543|
|||M. Hashemi, B. Moazed, S. Achenbach, D. Klymyshyn: "Functional Analysis of Single Poly(methylmathacrylate)-based Submicron Pore Electrophoretic Flow Detectors via Translocation of differently-sized Silica Nanoparticles". IET Nanobiotechnology. Vol 6 (4) (2012) pp. 149-155|
|||D. Haluzan, D. Klymyshyn, S. Achenbach, M. Börner, J. Mohr: "VM-TEST: Mechanical property measurement using electrostatically actuated vertical MEMS test structures fabricated in thick metal layers". Microsystem Technologies, Vol. 18 (2012) pp. 443-452|
|||D.M. Klymyshyn, M. Boerner, D. Haluzan, E. Gono Santosa, M. Schaffer, S. Achenbach, J. Mohr: "Vertical High-Q RF-MEMS Devices for Reactive Lumped Element Circuits". IEEE Transactions on Microwave Theory and Techniques, 58 (11) (2010) pp. 2976-2986|
|||D. M. Klymyshyn, T. Mappes, S. Achenbach, A. Kachayev, M. Börner, J. Mohr: "X-ray fabrication of SAW resonators with narrow electrodes in thick high-aspect-ratio polymer templates". Journal of Micromechanics and Microengineering, (2010), online June 2010 (6 pp.), DOI: 10.1088/0960-1317/20/7/075031|
|||D.T. Haluzan, D.M. Klymyshyn, S. Achenbach, M. Börner: "Reducing pull-in voltage by adjusting gap shape in electrostatically actuated cantilever and fixed-fixed beams". Micromachines, 1 (2) (2010) pp. 68-81|
|||S. Achenbach, D. Klymyshyn, B. Michel: "Editorial - Special issue of the 8th International Workshop on High Aspect Ratio Micro Structure Technology, HARMST 2009". Microsystem Technologies, Vol. 16, No. 8-9 (2009): 1285, DOI: 10.1007/s00542-010-1103-z.|
|||S. Achenbach, V. Subramanian, D. Klymyshyn, G. Wells: "Synchrotron Laboratory for Micro and Nano Devices - Facility Concept and Design". Microsystem Technologies, Vol. 16, Nr. 8-9 (2009) pp. 1293-1298|
|||V. Subramanian, S. Achenbach, D. Klymyshyn, G. Wells, W. Dolton, V. Nagarkal, C. Mullin, M. Augustin: "In-Situ Diagnostic Capabilities for Beam Position and Beam Intensity Monitoring at SyLMAND". Microsystem Technologies, Vol. 16, Nr. 8-9 (2009) pp. 1547-1551|
|||M. Hashemi, S. Achenbach, J. Lee, D. Klymyshyn, B. Moazed, R. Stefureac: "Design and Microfabriaction of a Polymer-Membrane based Sub-Micron Scale Electrophoretic Flow Detector for Biomedical Applications". Microsystem Technologies, Vol. 16, Nr. 8-9 (2009) pp. 1563-1567|
|||S. Achenbach, D. Klymyshyn, T. Mappes, A. Kachayev, V. Subramanian, G. Wells and J. Mohr: "Submicron-Scale Surface Acoustic Wave Resonators Fabricated by High Aspect Ratio X-Ray Lithography and Aluminum Lift-Off". Microsystem Technologies, Vol. 14, Nr. 9-11 (2008) pp. 1715-1719|
|||D. Haluzan, D. Klymyshyn, M. Börner, S. Achenbach, G. Wells, T. Mappes and J. Mohr: "Stiction Issues and Actuation of RF LIGA-MEMS Variable Capacitors". Microsystem Technologies, Vol. 14, Nr. 9-11 (2008) pp. 1709-1714|
|||Z. Ma, D. Klymyshyn, S. Achenbach, M. Börner, N. Dambrowsky and J. Mohr: "An Ultra-Deep High-Q Microwave Cavity Resonator Fabricated Using Deep X-Ray Lithography". IEICE Transactions on Electronics, Vol. E90-C, Nr. 12 (2007) pp. 2192-2197|
|||S. Achenbach, D. Klymyshyn, D. Haluzan, T. Mappes, G. Wells and J. Mohr: "Fabrication of RF MEMS Variable Capacitors by Deep X-Ray Lithography and Electroplating". Microsystem Technologies, Vol. 13, No. 3-4 (2007) pp. 343-348|
|||S. Achenbach, M. Börner, S. Kinuta, W. Bacher, J. Mohr, V. Saile and Y. Saotome: "Structure Quality in Deep X-Ray Lithography Applying Commercial Polyimide-Based Masks". Microsystem Technologies, Vol. 13, No. 3-4 (2007) pp. 349-354|
|||T. Mappes, S. Achenbach and J. Mohr: "Process Conditions in X-Ray Lithography for the Fabrication of Devices with Submicron Feature Sizes". Microsystem Technologies, Vol. 13, No. 3-4 (2007) pp. 355-360|
|||D. Klymyshyn, D. Haluzan, M. Börner, S. Achenbach, J. Mohr and T. Mappes: "High Aspect Ratio Vertical Cantilever RF-MEMS Variable Capacitor". IEEE Microwave and Wireless Component Letters (MWCL), Vol. 17, No. 2 (2007) pp. 127-129|
|||T. Mappes, S. Achenbach and J. Mohr: "X-Ray Lithography for Devices with High Aspect Ratio Polymer Submicron Structures". Microelectronic Engineering, Vol. 84 (2007) pp. 1235-1239|
|||Z. Ma, D. Klymyshyn, S. Achenbach and J. Mohr: "Microwave Cavity Resonators Using Hard X-Ray Lithography". Microwave and Optical Technology Letters, Vol. 47, No. 4 (2005) pp. 353-357|
|||S. Achenbach: "Deep Sub Micron High Aspect Ratio Polymer Structures Produced by Deep X-Ray Lithography". Microsystem Technologies, Vol. 10, No. 6-7 (2004) pp. 493-497|
|||T. Mappes, S. Achenbach, A. Last, J. Mohr and R. Truckenmüller: "Evaluation of Optical Qualities of a LIGA-Spectrometer in SU-8". Microsystem Technologies, Vol. 10, No. 6-7 (2004) pp. 560-563|
|||S. Achenbach, T. Mappes and J. Mohr: "Structure Quality of High Aspect Ratio Sub Micron Polymer Structures Patterned at the Electron Storage Ring ANKA". Journal of Vacuum Science & Technology, Vol. B 22, No. 6 (2004) pp. 3196-3201|
|||V. Nazmov, E. Reznikova, A. Snigirev, I. Snigireva, J. Mohr, S. Achenbach and V. Saile: "Fabrication and Preliminary Testing of X-Ray Lenses in Thick SU-8 Resist Layers". Microsystem Technologies, Vol. 10, No. 10 (2004) pp. 716-721|
|||S. Achenbach, F.J. Pantenburg and J. Mohr: "Numerical Simulation of Heating and Thermal Distortions During Exposure in Deep X-Ray Lithography Microstructures". Microsystem Technologies, Vol. 9, No. 3 (2003) pp. 220-224|
|||S. Achenbach, J. Mohr and F.J. Pantenburg: "Application of Scanning Probe Microscopy for the Determination of the Structural Accuracy of High Aspect Ratio Microstructures". Microelectronic Engineering, Vol. 53 (2000) pp. 637-640|
|||F.J. Pantenburg, S. Achenbach and J. Mohr: "Characterization of Defects in Very High Deep-Etch X-Ray Lithography Microstructures". Microsystem Technologies, Vol. 4, No. 2 (1998) pp. 89-93|
|||J. Zanghellini, S. Achenbach, A. El-Kholi, J. Mohr and F.J. Pantenburg: "New Development Strategies for High Aspect Ratio Microstructures". Microsystem Technologies, Vol. 4, No. 2 (1998) pp. 94-97|
|||F.J. Pantenburg, S. Achenbach and J. Mohr: "Influence of Developer Temperature and Resist Material on the Structure Quality in Deep X-Ray Lithography". Journal of Vacuum Science & Technology, Vol. B 16, No. 6 (1998) pp. 3547-3551|
|||F. J. Pantenburg, S. Achenbach, M. Börner, J. Mohr, V. Saile: "X-ray beamlines at the microfabrication laboratory at ANKA". Accepted for publication in Nuclear Instruments and Methods|
|||S. Achenbach, D. Klymyshyn, V. Subramanian, F. Reuther, C. Mullin, G. Wells, V. Nagarkal: "An ultra-large-area Beryllium vacuum window for the X-ray lithography beamline SyLMAND at the Canadian Light Source”. Accepted for publication in Nuclear Instruments and Methods in Physics Research A (NIMS A)|
Books / Chapters in Books
|||S. Achenbach and D. Klymyshyn: "RF Applications". Advanced Micro and Nanosystems, Vol. 7, “LIGA and Its Applications”, Wiley VCH, Weinheim, Germany (ISBN: 978-3-527-31698-4) (2009) pp. 243-280|
|||A. Rashidian, D.M. Klymyshyn, M.T. Aligodarz, M. Börner, S. Achenbach: "Polymer-based Resonator Antennas". US Patent, Publication Nr. "WO 2013016815 A1", publication date 7. Feb 2013.|Graduate Students
Selected recent graduates (and students close to graduating):
University of Karlsruhe, Germany
This Ph.D. project aimed at extending deep X-ray lithography process technology for deep sub micron lateral feature size high aspect ratio polymer structure patterning.
Potential advantages include very vertical sidewalls in several micrometers thick resist layers at feature sizes of 400nm and above. Batch processing allows for a higher throughput than serial writing techniques. Challenges include primary patterning and mask fabrication, resist handling, exposure parameters, and layout correction.
Applications include novel fluidic test structures, highest resolution surface acoustic wave filter patterns and infrared bandpass filters for interstellar missions.
Timo defended his thesis in February 2006, with great distinction.
He currently leads his research group as a private lecturer at the Karlsruhe Institute of Technology (KIT) in Germany.
Co-supervision with Dr. D. Klymyshyn
This Ph.D. project explores the potential to fabricate high frequency RF MEMS devices using the LIGA process sequence. Taking advantage of high aspect ratio patterning, non-planar lumped devices such as high Q variable capacitors are fabricated. Challenges include theoretical device layout as well as various fabrication aspects.
First proofs-of-principle showed that these novel devices include characteristics that can already compete with leading planar microdevices and have the potential to outperform them.
Darcy's project includes extensive fieldtrips to Europe.
He was co-funded by an NSERC Industrial Scholarship and an ECE/College of Graduate Studies and Research Devolved Scholarship.
This Ph.D. project bridges engineering and science aspects of micro processing with applications aspects of biomedical devices. Novel prion detectors will get developed that allow to detect the small amounts of prions that are, e.g., present in Mad Cow Disease infected animals and damage their central nervous system.
Manouchehr joined the group in June 2006.
He is co-funded in parts by the University of Saskatchewan, TRLabs, and an ECE/College of Graduate Studies and Research Devolved Scholarship.
in collaboration with the University of Karlsruhe, Germany
This M.Sc. project aimed at adjusting the synchrotron spectrum used at the SyLMAND facility at the Canadian Light Source.
Based on the grazing incidence double mirror system currently getting installed at the beamline, and different simulation suites, simulation tools are verified and tested, exposure parameters derived, mirror control routines tested, and hardware upgrades performed.
Martin finished his degree at the University of Karlsruhe in Germany and now is a Ph.D. student at the Karlsruhe Institute of Technology (KIT) in Germany.
Co-supervision with Dr. Q. Yang
This M.Sc. project explored options for energy-autonomous sensors to be embedded into roads. Piezoelectric sensors were developed that also harvest energy for radio frequency broadcasting of measured data to a base station on the road side.
Brandon defended in September of 2011 and now works for a startup company in Saskatoon.
Summer and International Exchange StudentsSeveral undergraduate and graduate level students have joined the research group for confined research projects related to microfabrication processes and equipment development.
Those projects included, among others, the design of a home-built, limited-resolution UV lithography system for conductor layer substrate prefabrication, and a lithography exposure dose monitoring sensor system.
Undergraduate Capstone Design Project Groups
Groups of undergraduate students in their final year work on design projects as part of their degrees. Some of these groups have turned their design project into a research project at the Canadian Light Source. A recent project involved the design of a novel, electrostatic substrate clamping mechanism to be integrated into the X-ray lithography scanner at the SyLMAND beamline.
EE817Microfabrication by Deep X-Ray Lithography applying Synchrotron Radiation
The course is a multidisciplinary introduction to advanced lithographic microfabrication processes, specifically focusing on X-ray lithography (XRL) using synchrotron radiation and on the LIGA process. Related process technologies and typical applications are discussed in-depth, additionally introducing various processes relevant to academic research and industrial applications in microsystems and microelectronics.
EE471Introduction to Micro and Nano Technology
The course is a multidisciplinary introduction to the processing of micro- and nano scale structures which are applied in emerging fields of high resolution patterning such as micro/nano electronics, photonics, fluidics. Fundamental technology issues (materials, equipment, fabrication steps, inspection) are discussed. Selected key processes in microfabrication and nanofabrication and its applications/devices are presented.
Starting in the 2014/2015 academic year, EE471 will be offered in terms 1 (Fall) as a core class in the "Sensors, Circuits and Devices" Focus Area of the new Electrical and Computer Engineering program. The course is also addressed to students from other engineering programs (ME, EP, etc.) and science programs.
A 2P laboratory component (8 sessions of 3 hours) will be added to the lectures. These labs introduce students to practical and applied aspects of micro- and nano technology. Some of them will be held at the SyLMAND facility of the Canadian Light Source, offering students experience in a large-scale research clean room environment, using various fabrication and inspection equipment, and working on their own MEMS component.
EE392Electrical Engineering Laboratory II
Laboratory experiments and exercises of design software packages for 3rd-year EE students.
4 Instructors, coordinated by Prof. Johanson.
PHYS155Introduction to Electricity and Magnetism
The course is mandatory for all first year engineering students. It is taught by 3 instructors.
The first section starts with an introduction to electricity: elementary electric charge, Coulomb’s law, concepts of electric field and electrostatic potential, work, energy and capacitance, and dielectrics.
Canada Research Chair in Micro and Nano Device Fabrication
Principal Investigator of SyLMAND,the Synchrotron Laboratory for Micro and Nano Devices, at the new Canadian Light Source (CLS)
Adjunct Scientist of TRLabs, Telecommunication Research Labs of Canada, at Innovation Place, Saskatoon
Research projects cover
- Microfabrication Process Technology
- X-Ray Lithography
- Synchrotron Beamline Layout & Operation RF and Microwave MEMS Devices
- Biomedical Applications of Microdevices